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過(guò)程工程師英文簡(jiǎn)歷表
在快速瀏覽個(gè)人簡(jiǎn)歷的情況下,想要提高通過(guò)率基本的信息符合最為重要。在中多的個(gè)人簡(jiǎn)歷中有的是條件符合人,那么那些條件不符合的則就會(huì)在第一時(shí)間淘汰掉。因此,個(gè)人簡(jiǎn)歷中的基本信息上一定要符合對(duì)方招聘的條件要求。
在眾多的個(gè)人簡(jiǎn)歷中每一份簡(jiǎn)歷所看的時(shí)間都非常短,一份普通的個(gè)人簡(jiǎn)歷如果不能在外形上突出,則在照片上就要能突出。畢竟有圖的部分最容易受到關(guān)注。個(gè)人簡(jiǎn)歷上的照片一來(lái)要標(biāo)準(zhǔn),不能是大頭貼也不能是生活照,使用證件照就可以了。二來(lái)照片要顯得人特別的有精神,最好不用使用修圖軟件。
在高競(jìng)爭(zhēng)中往往能夠體現(xiàn)在各個(gè)方面,如第一印象就非常重要,也可以說(shuō)瀏覽的方式主要就是通過(guò)第一印象來(lái)選拔。個(gè)人簡(jiǎn)歷從整體上來(lái)說(shuō)排版要非常的明了,能夠讓人清晰的看出簡(jiǎn)歷上的信息。當(dāng)然也需要字體以及自號(hào)來(lái)靈活使用,從而可以吸引到對(duì)方。
Name:yjbys | Hukou:Zhejiang | |||||
Residency: | Work Experience: | |||||
Current Salary: | Tel: | |||||
E-mail:www.ruiwen.com/jianli | ||||||
Career Objective | ||||||
Desired Industry: | Electronics/Semiconductor/IC | |||||
Desired Position: | IC Design/Application Engineer ,Semiconductor Technology | |||||
Desired address: | Shanghai ,Jiangsu | Desired Salary: | Negotiable | |||
Work Experience | ||||||
2005/12—Present | ***Company | |||||
Industry: Electronics/Semiconductor/IC Diffusion Process Engineer Responsibilities: 1. Qualify new equipments & products. 2. Establish new process recipes. 3. Co work with PIE to handle relative WAT fails cases, and provide preventive action. 4. Co work with EE to deal with inline defect case, and optimize it. 5. SPC Project maintenance & optimization. 6. Operation introduction development. |
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2003/08—2005/11 | HuaYue micro electric company LTD. | |||||
Industry: Electronics/Semiconductor/IC Implant Process Engineer Responsibilities: 1. New Implant process recipe establishment. 2. Perform FAB product plan. 3. Co work with PIE&PDE to deal with PCM fails issues. 4. Co work with EE to maintain Implant equipments to produce smoothly and effectively. 5. Daily monitor SPC Project maintenance & optimization. |
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Education and Training | ||||||
1999/09—2003/08 |
Hefei University of Technology Electronic Science And Technology Bachelor |
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Professional Skills | ||||||
Language Skills: | English: VERY GOOD | |||||
Certificate: | 2001/09 CET4 |
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